Thank you to all attendees for participating in last week's
Joint Symposium on US and European Patent Practice in Munich. While
the laws of patent practice are ever-changing worldwide, we hope
all participants were able to take away some important information
on how these changes affect the practices in both the US and
Europe.
A special thank you to our esteemed colleagues at Maiwald for
co-hosting this event and we look forward to continuing this event
in the future.
Pictured: Andrew Ollis, Daniel Pereira, Martina Boidol, James Love,
Norbert Hansen, Annelie Wünsche, Derk Vos, David Longo and
Tobias Philipp
